Columbia Engineering researchers report that they have demonstrated a nearly ideal transistor made from a 2D material stack — with only a two-atom-thick semiconducting layer — by developing a completely clean and damage-free fabrication process. Their method shows vastly improved performance compared to 2D semiconductors fabricated with a conventional process, and could provide a scalable platform for creating ultra-clean devices in the future.
Ultra-clean fabrication platform produces nearly ideal 2D transistors
Columbia Engineering researchers report that they have demonstrated a nearly ideal transistor made from a 2D material stack -- with only a two-atom-thick semiconducting layer -- by developing a comple..
